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Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea Technology by Katia Vutova, Georgi Mladenov

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea

Reads:
36
Pages:
33
Published:
Nov 2013

The basic steps when modeling the ion and electron exposure processes in multilevel multicomponent amorphous targets by the simulation of particle penetration...

Formats: PDF