Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea

Author:

Downloads: 29

Pages: 33

Published: 7 years ago

Rating: Rated: 0 times Rate It

  • 1 star
  • 2 stars
  • 3 stars
  • 4 stars
  • 5 stars

Read Five Books Free!

Become a member of Free-Ebooks.net and you can download five free books every month.

Already a member? Login here

Membership requires a valid email address. We DO NOT spam and do not allow others access to your private information.

Book Description

The basic steps when modeling the ion and electron exposure processes in multilevel multicomponent amorphous targets by the simulation of particle penetration into materials and the calculation of the absorbed energy distribution within the targets by means of a software package.

Reader Reviews
loading comments
Add a comment: (You need to login to post a comment)
Rate this title: