Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea
Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea is a free 33-page technology ebook by Katia Vutova, Georgi Mladenov, published Nov 2013. It is free to download in PDF, ePub, and Kindle formats — no payment required.
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Author: Katia Vutova, Georgi Mladenov
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Pages: 33
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The basic steps when modeling the ion and electron exposure processes in multilevel multicomponent amorphous targets by the simulation of particle penetration into materials and the calculation of the absorbed energy distribution within the targets by means of a software package.
Last updated: January 1, 2014
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