The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies
The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies is a free 33-page engineering ebook by Hsing-Huang Tseng, Ph.D., published Nov 2013. It is free to download in PDF, ePub, and Kindle formats — no payment required.
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Author: Hsing-Huang Tseng, Ph.D.
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Pages: 33
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A study on the obstacles and development of High-k/Metal-Gated Devices for application to Advanced CMOS Technologies
Last updated: December 26, 2013
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