Hsing-Huang Tseng, Ph.D. Profile
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The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies Engineering by Hsing-Huang Tseng, Ph.D.The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies
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45Pages:
33Published:
Nov 2013A study on the obstacles and development of High-k/Metal-Gated Devices for application to Advanced CMOS Technologies
Formats: PDF