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Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea

Downloads: 16         Pages: 33

Published: 3 years ago

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The basic steps when modeling the ion and electron exposure processes in multilevel multicomponent amorphous targets by the simulation of particle penetration into materials and the calculation of the absorbed energy distribution within the targets by means of a software package.


Katia Vutova, Georgi Mladenov

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