A Method for Optical Proximity Correction of Thermal Processes: Orthogonal Functional Method


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Published: 4 years ago

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Book Description

The objectives of this study are as follows: to make the physically corrected resist model based on the understanding of mechanistic behaviors that drive photo resist image, to achieve the best prediction of resist images across multiple process conditions, and to develop a general simulation approach of OPC to reduce the OPEs during lithography thermal processes.

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